Intel's High Numerical Aperture Extreme Ultraviolet lithography tool in a clean room at Intel Corporation's Fab D1X in Hillsboro, Oregon, in April 2024.
This 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. The second delivery from ASML has just been received by an unnamed customer, likely Samsung.
TSMC says low-NA double patterning is still less expensive than high-NA single exposure with the new ASML machine.
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