| Followers | 38 |
| Posts | 13168 |
| Boards Moderated | 0 |
| Alias Born | 07/09/2002 |
Thursday, April 18, 2024 8:28:55 PM
Intel's High Numerical Aperture Extreme Ultraviolet lithography tool in a clean room at Intel Corporation's Fab D1X in Hillsboro, Oregon, in April 2024.
This 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. The second delivery from ASML has just been received by an unnamed customer, likely Samsung.
TSMC says low-NA double patterning is still less expensive than high-NA single exposure with the new ASML machine.
Intel says use of long-researched 14A Directed Self-Assembly (DSA) will produce far lower costs. - https://www.semianalysis.com/p/intels-14a-magic-bullet-directed
This 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. The second delivery from ASML has just been received by an unnamed customer, likely Samsung.
TSMC says low-NA double patterning is still less expensive than high-NA single exposure with the new ASML machine.
Intel says use of long-researched 14A Directed Self-Assembly (DSA) will produce far lower costs. - https://www.semianalysis.com/p/intels-14a-magic-bullet-directed
We've run out of other people's Social Security taxes needed to subsidize our low income tax rates.
Join the InvestorsHub Community
Register for free to join our community of investors and share your ideas. You will also get access to streaming quotes, interactive charts, trades, portfolio, live options flow and more tools.
